Silicon Devices and Process Integration: deep submicron and nano-scale technologies Badih El-Kareh
Material type:
TextPublication details: New York Springer Verlag, Netherlands 2009Description: xxv, 597pISBN: 9780387367989Subject(s): Linear integrated circuits -- Design | Metal oxide semiconductors, ComplementaryDDC classification: 621.3815 ELK
| Item type | Current library | Collection | Call number | Vol info | Status | Date due | Barcode | Item holds |
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REFERENCE BOOK
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LRC_JUIT Electronics & Communication Engineering | REFERENCE SECTION | REF 621.3815 ELK (Browse shelf (Opens below)) | Copy 1 | Not for loan | 025950 |
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| REF 621.3815 DIN High-Linearity CMOS RF Front-End Circuits | REF 621.3815 DRE Formal Verification of Circuits | REF 621.3815 DUT Technology CAD: computer simulation of IC processes and devices | REF 621.3815 ELK Silicon Devices and Process Integration: deep submicron and nano-scale technologies | REF 621.3815 ESM Advanced Simulation Methods for ESD Protection Development | REF 621.3815 FUH Sequential Optimization of Asynchronous and Synchronous Finite State Machines | REF 621.3815 FUL Rapid IO: the embedded system interconnect |
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