Microlithography: science and technology James R. Sheats
Material type: TextPublication details: New York Marcel Dekker Inc. 1998Description: xii, 780pISBN: 0824799534Subject(s): Microlithography | Metal oxide semiconductorDDC classification: 621.381531 SHEItem type | Current library | Collection | Call number | Vol info | Status | Date due | Barcode | Item holds |
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REFERENCE BOOK | LRC_JUIT Electronics & Communication Engineering | REFERENCE SECTION | REF 621.381531 SHE (Browse shelf (Opens below)) | Copy 1 | Not for loan | 018670 |
Total holds: 0
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REF 621.3815284 ENZ Charge-Based MOS Transistor Modelling: the EKV model for low power and RF IC design | REF 621.38153 SUN Strain Effect in Semiconductors: theory and device applications | REF 621.381531 GRA Signal Propagation on Interconnects | REF 621.381531 SHE Microlithography: science and technology | REF 621.381532 GRA Transistor Level Modeling for Analog / RF IC Design | REF 621.3815324 APO QRD-RLS Adaptive Filtering | REF 621.3815324 BEL Adaptive Digital Filters |
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